Study covering all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The first section covers the lithographic process from substrate preparation to exposure, with an emphasis on the nature and behavior or photoresist materials. The second section examines the process from development through inspection (both before and after pattern transfer), which includes an introduction to optical masks, aligners, steppers, and scanners as well as CD control and profile control of photoresists. The last section covers advanced lithographic techniques such as c-beam, x-ray, EUV, and ion beam lithography. 3 Credits (2 Lecture - 3 Lab)