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Course Descriptions

EET274
Thin Films in Nanofabrication (PSU: ESC213)
The basics of thin films including growth, structure, mechanical properties, electrical properties, deposition equipment will be examined in the first part of this course. This will include atmospheric, low pressure, and plasma enhanced chemical vapor deposition and sputtering, thermal evaporation, and beam evaporation physical vapor deposition. Materials to be considered will include dielectrics (nitride, oxide), polysilicon (doped and undoped), and metals (aluminum, tungsten, copper, adhesion promoters, diffusion barriers). The second part of the course will focus on etching processes and will emphasize reactive ion etching (single wafer, batch), high-ion-density reactors (TCP, helicon, ECR, MERIE), and ion beam etching. Student will receive hands-on experience in depositing and etching dielectric, semiconductor, and metal materials using state-of-the-art tools. 3 Credits (2 Lecture - 3 Lab) Prerequisite(s): EET271.